$25.00
- There are no more items in your cart
- Shipping
- Total $0.00
- PAC
- PLCs
- HMI
- Motors & Drives
- Sensors & Transducers
- Switches & Relays
- Motion Control
- Power Supplies
- Connectivity
- Instrumentation
- Pneumatic Automation
- Hydraulic Automation
- Safety Devices
- Maintenance & Repair
- Accessories
- Laboratory, Industrial and Testing Equipment
- Networks
- New Entries
- Pending Brand
- Electronic Boards for Spare Parts
- Packaging - Labeling & Printing
$25.00
$30.00
$25.00
Reference: 802B-CSADXSXD4 SER A
Brand: Allen-Bradley (Rockwell Automation)
Allen-Bradley 802B-CSADXSXD4 SER A Compact Limit Switch
The Allen-Bradley 802B-CSADXSXD4 SER A is a compact limit switch designed for industrial applications, featuring a top push roller actuator and a side-mounted quick disconnect for efficient installation and reliable performance.
$130.00
Reference: 00036672
Challenger E-16248 Circuit Breaker
The Challenger E-16248 is a robust two-pole circuit breaker with a 20-amp maximum rating and 120/240 VAC voltage rating, featuring a thermal magnetic trip mechanism for quick response to overload conditions, ensuring optimal safety and performance in various electrical applications.
$25.00
-
Banner
Kaiser Systems E-GUN 1101309-2
The Kaiser Systems E-GUN 1101309-2 is an electron beam (e-beam) evaporation source designed for precise thin-film deposition in semiconductor manufacturing and materials research.
Security policy
We offer many payment options to make your purchasing experience secure, easy and flexible.
Delivery policy
In-stock products: Same day shipping Mon. through Fri. by 6:00 pm EST.
Return policy
90-days money back guarantee
Description
Manufactured by Kaiser Systems, the E-GUN 1101309-2 utilizes a focused electron beam to heat and evaporate materials, enabling controlled deposition of thin films onto substrates. This technique is essential in producing high-purity and uniform coatings for applications such as microelectronics and optical devices. The system is engineered for integration into ultra-high vacuum environments, ensuring contamination-free deposition processes. Its design emphasizes reliability and precision, catering to the stringent demands of advanced material fabrication.
Features:
- Deposition Method: Electron beam evaporation
- Application: Thin-film deposition for semiconductor and materials research
- Environment: Compatible with ultra-high vacuum systems
- Design Focus: High precision and reliability
Product Details
E-GUN
9 Items
New
Specific References
- MPN
- 1101309-2
The Kaiser Systems E-GUN 1101309-2 is an electron beam (e-beam) evaporation source designed for precise thin-film deposition in semiconductor manufacturing and materials research.